Titanium Tube Target Vacuum Coating Target Titanium Gr1 ASTM B861-06 a 133OD*125ID*840
| Item name |
Titanium tube target
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| Size |
φ133*φ125*840 |
| Grade |
Gr1 |
| Packaging |
Vacuum package in wooden case |
| Port of place |
Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. To put it simply, the target material is the target material of high-speed charged particles bombardment. When used in high-energy laser weapons, different power densities, different output waveforms and different wavelengths of laser interact with different targets, different killing and destruction effects will be produced. Vacuum coating refers to heating metal or non-metal materials under high vacuum conditions, so that it evaporates and condenses on the surface of plated parts (metal, semiconductor or insulator) and forms a film method. Vacuum coating technology is generally divided into two categories, namely physical vapor deposition (PVD) technology and chemical vapor deposition (CVD) technology. Physical vapor deposition technology refers to the method of directly depositing the plating material on the surface of the substrate by gasification into atoms and molecules or ionization into ions by various physical methods under vacuum conditions. Features:
(1) all kinds of coating technology need a specific vacuum environment, in order to ensure that the film material in heating evaporation or sputtering process formed by the movement of vapor molecules, not by many atmospheric gas molecules collision, block and interference, and eliminate the adverse effects of impurities in the atmosphere.
(2) All kinds of coating technology need to have an evaporation source or target, in order to vaporize the film material into gas. Due to the continuous improvement of source or target, the selection range of film-making materials has been greatly expanded. Whether metal, metal alloy, intermetallic compound, ceramic or organic material, all kinds of metal and dielectric films can be steamed, but also different materials can be steamed at the same time to get multilayer films.
(3) evaporation or sputtering film making materials, in the process of forming a film with the workpiece to be plated, the film thickness can be measured and controlled more accurately, to ensure the uniformity of the film thickness.
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance
Product Tags:
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Low Density High Strength PVD CVD Gr1 Ti Tube Target Images
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